CHEN Longxi, LEI Wenqing, WU Bin. Numerical Study on Effect of Equilibrium Current Profile on Resistive Wall Mode Stability[J]. Chinese Journal of Computational Physics, 2013, 30(6): 902-908.
Citation: CHEN Longxi, LEI Wenqing, WU Bin. Numerical Study on Effect of Equilibrium Current Profile on Resistive Wall Mode Stability[J]. Chinese Journal of Computational Physics, 2013, 30(6): 902-908.

Numerical Study on Effect of Equilibrium Current Profile on Resistive Wall Mode Stability

  • Effect of equilibrium current profile on resistive wall mode stability are numerically studied. The most unstable mode with different equilibrium current profiles under fixed safety factor at plasma surface has same poloidal number and toroidal number. At same wall location, linear growth rate of (3,1) mode of non-uniform current profile is greater than that of uniform current profile. Effect of plasma flow on resistive wall mode stability is different with different current profiles. After linear evolution, RWM saturates at nonlinear phase. Saturation can be attributed to flux piling up on resistive wall. Saturation level of non-uniform current profile is lower than that of uniform current profile.
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