Chao , LanLan PING. Numerical Simulation Study on Discharge Characteristics and Power Deposition of Helicon Plasma SourceJ. Chinese Journal of Computational Physics. DOI: 10.19596/j.cnki.1001-246x.2026-9304
Citation: Chao , LanLan PING. Numerical Simulation Study on Discharge Characteristics and Power Deposition of Helicon Plasma SourceJ. Chinese Journal of Computational Physics. DOI: 10.19596/j.cnki.1001-246x.2026-9304

Numerical Simulation Study on Discharge Characteristics and Power Deposition of Helicon Plasma Source

  • To reveal the discharge mechanism and power deposition regulation law of helicon wave plasma sources, a two-dimensional axisymmetric multi-physics field coupling numerical model of helicon wave plasma is established with argon as the working gas. The effects of radio frequency power, discharge pressure, axial static magnetic field intensity and annular antenna turns on electron number density, electron temperature, collisional power loss and spatial distribution of power deposition are systematically investigated. The results show that increasing radio frequency power can significantly raise electron number density and power deposition with no obvious variation in electron temperature. Higher discharge pressure leads to increased electron number density and decreased electron temperature. Relatively high electron density and energy deposition can be achieved near 0.04 T. Increasing antenna turns can effectively enhance plasma ionization intensity and wave-particle energy coupling efficiency. The research findings provide a theoretical reference for parameter optimization and engineering design of helicon wave plasma sources.
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