螺旋波等离子体源放电特性及功率沉积数值模拟研究

Numerical Simulation Study on Discharge Characteristics and Power Deposition of Helicon Plasma Source

  • 摘要: 为揭示螺旋波等离子体源放电机理与功率沉积调控规律,建立二维轴对称螺旋波等离子体多物理场耦合数值模型,以氩气为工质,系统研究射频功率、放电气压、轴向静磁场强度、环形天线匝数对电子数密度、电子温度、碰撞功率损耗及功率沉积空间分布的影响规律。结果表明:射频功率升高可显著提升电子数密度与功率沉积,电子温度无明显变化;放电气压增大使电子数密度升高、电子温度降低;0.04 T 附近可获得较高电子密度与能量沉积;增加天线匝数能够有效提升等离子体电离强度与波粒能量耦合效率。研究结果可为螺旋波等离子体源参数优化与工程设计提供理论参考。

     

    Abstract: To reveal the discharge mechanism and power deposition regulation law of helicon wave plasma sources, a two-dimensional axisymmetric multi-physics field coupling numerical model of helicon wave plasma is established with argon as the working gas. The effects of radio frequency power, discharge pressure, axial static magnetic field intensity and annular antenna turns on electron number density, electron temperature, collisional power loss and spatial distribution of power deposition are systematically investigated. The results show that increasing radio frequency power can significantly raise electron number density and power deposition with no obvious variation in electron temperature. Higher discharge pressure leads to increased electron number density and decreased electron temperature. Relatively high electron density and energy deposition can be achieved near 0.04 T. Increasing antenna turns can effectively enhance plasma ionization intensity and wave-particle energy coupling efficiency. The research findings provide a theoretical reference for parameter optimization and engineering design of helicon wave plasma sources.

     

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